Focus Webinar | Semiconductor Series: Part 2

Understanding Particle Removal Efficiency (PRE)

How substrate surface characteristics influence removal mechanisms in p-CMP cleaning


In the second webinar in this three-part series, we will focus on the surface science behind particle removal during post-CMP cleaning and how substrate properties influence PRE mechanisms. We will discuss how surface energy, wettability, roughness, and chemical condition affect particle adhesion and removal, and why these factors can cause cleaning performance to vary from one substrate to another.

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Register now for this live webinar hosted by Dr. Jason Keleher (Lewis University, Keleher Research Group) to learn about the breakthrough research he and his team are performing in the semiconductor space!

The DSA100W will play a key role in this topic by allowing us to measure contact angle and surface energy to better understand particle-substrate interactions and how cleaning chemistries modify those interactions. In addition, the DFA100 can be used to study dynamic liquid behavior, such as bubble generation or fluid changes in cleaning formulations, which may also influence particle displacement and transport away from the surface.

What you will learn

  • How substrate surface characteristics influence particle adhesion and removal in p-CMP cleaning
  • How the DSA100W can be used to measure wettability and surface energy relevant to PRE
  • How changes in surface condition can impact particle-substrate interactions and cleaning efficiency
  • How the DFA100 can provide supporting information on fluid and bubble behavior that may influence particle removal mechanisms

Webinar series

  • Part 1: Engineering Surface Reactions in CMP
    How modified chemistries control surface interactions to enhance performance

  • Part 2: Understanding Particle Removal Efficiency (PRE)
    How substrate surface characteristics influence removal mechanisms in p-CMP cleaning

  • Part 3: Imagining a More Sustainable CMP and p-CMP Future
    Balancing performance, defect control, and environmental impact through surface science

Speaker

Dr Jason Keleher 1200x1200

Dr. Jason J. Keleher is Full Professor and Chair of Chemistry at Lewis University, where he leads the Keleher Research Group (KRG), focusing on engineered nanoparticles, hybrid materials, surface interactions, and sustainable technologies. Prior to academia, he held research positions at Komag and Cabot Microelectronics (now Entegris), earning the company's Inventor of the Year award for his contributions to surface chemistry and product development. An award-winning educator and advocate for diversity in STEM, Dr. Keleher has co-authored more than 50 peer-reviewed publications, been awarded 25 U.S. patents, and delivered over 500 technical presentations worldwide.

Live Webinar

Register for our live webinar with Dr. Jason Keleher to discover the surface science behind particle removal during post-CMP cleaning and how substrate properties influence PRE mechanisms.

➤ Date: Wednesday, August 12, 2026

➤ Time: 10 am CDT | 5 pm CEST | 3 pm UTC

Can't make the date? Register to receive the recording after the webinar.

 

Register now for the webinar

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